DocumentCode
1079573
Title
Laser annealing of ion implant damage in semiconductors
Author
Brown, Walter
Author_Institution
Bell Telephone Laboratories, Murray Hill, NJ
Volume
15
Issue
9
fYear
1979
fDate
9/1/1979 12:00:00 AM
Firstpage
989
Lastpage
989
Keywords
Heat treatment; Laser applications, materials processing; Semiconductor defects; Amorphous silicon; Annealing; Implants; Laboratories; Laser beams; Laser modes; Pulsed laser deposition; Semiconductor lasers; Solid lasers; Telephony;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/JQE.1979.1070306
Filename
1070306
Link To Document