• DocumentCode
    1079927
  • Title

    Metal-(n) AlGaAs-GaAs two-dimensional electron gas FET

  • Author

    Delagebeaudeuf, Daniel ; Linh, Nuyen T.

  • Author_Institution
    Thomson-CSF, Orsay, France
  • Volume
    29
  • Issue
    6
  • fYear
    1982
  • fDate
    6/1/1982 12:00:00 AM
  • Firstpage
    955
  • Lastpage
    960
  • Abstract
    Theoretical calculations have been developed for a two-dimensional electron gas FET (TEGFET) constituted by a AlGaAs (n)-GaAs (n-or p-) heterostructure in which the Schottky gate is deposited on the AlGaAs(n) top layer. The theory takes into account: i) the subband splitting in the two-dimensional electron gas (2-DEG); and ii) the existence of an undoped AlGaAs spacer layer which has been found to enhance the electron mobility. The sheet carrier concentration of the TEGFET has been calculated, and a simple analytical formula has been established for the charge control in large and small gate FET.
  • Keywords
    Electron mobility; FETs; Gallium arsenide; HEMTs; Helium; Heterojunctions; Impurities; MODFETs; Noise figure; Superlattices;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1982.20813
  • Filename
    1482310