• DocumentCode
    1080037
  • Title

    On the condition of strong inversion and terminal voltages in MOS structures with nonuniform and degenerate doping

  • Author

    Shrivastava, Ritu ; Marshak, Alan H.

  • Author_Institution
    Mostek Corporation, Carrolton, TX
  • Volume
    29
  • Issue
    6
  • fYear
    1982
  • fDate
    6/1/1982 12:00:00 AM
  • Firstpage
    1009
  • Lastpage
    1013
  • Abstract
    An expression is derived which relates the potentials at the surface and the depletion layer edge at the onset of strong inversion to the applied voltage between source and bulk of an MOS structure. The expression is valid for degenerate and nonuniformly doped substrates. A new definition of strong inversion is proposed which reduces to the definition given by Doucet and van de Wiele under nondegenerate conditions. A simplified structure is considered which allows the MOS device to be analyzed using a one-dimensional model. The role of metal-semiconductor contacts and the assumptions involved in the analysis are discussed.
  • Keywords
    Conductors; Contacts; Doping; Equations; Helium; Impurities; Ion implantation; MOS devices; Semiconductor process modeling; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1982.20823
  • Filename
    1482320