DocumentCode
1080037
Title
On the condition of strong inversion and terminal voltages in MOS structures with nonuniform and degenerate doping
Author
Shrivastava, Ritu ; Marshak, Alan H.
Author_Institution
Mostek Corporation, Carrolton, TX
Volume
29
Issue
6
fYear
1982
fDate
6/1/1982 12:00:00 AM
Firstpage
1009
Lastpage
1013
Abstract
An expression is derived which relates the potentials at the surface and the depletion layer edge at the onset of strong inversion to the applied voltage between source and bulk of an MOS structure. The expression is valid for degenerate and nonuniformly doped substrates. A new definition of strong inversion is proposed which reduces to the definition given by Doucet and van de Wiele under nondegenerate conditions. A simplified structure is considered which allows the MOS device to be analyzed using a one-dimensional model. The role of metal-semiconductor contacts and the assumptions involved in the analysis are discussed.
Keywords
Conductors; Contacts; Doping; Equations; Helium; Impurities; Ion implantation; MOS devices; Semiconductor process modeling; Threshold voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1982.20823
Filename
1482320
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