DocumentCode :
1080037
Title :
On the condition of strong inversion and terminal voltages in MOS structures with nonuniform and degenerate doping
Author :
Shrivastava, Ritu ; Marshak, Alan H.
Author_Institution :
Mostek Corporation, Carrolton, TX
Volume :
29
Issue :
6
fYear :
1982
fDate :
6/1/1982 12:00:00 AM
Firstpage :
1009
Lastpage :
1013
Abstract :
An expression is derived which relates the potentials at the surface and the depletion layer edge at the onset of strong inversion to the applied voltage between source and bulk of an MOS structure. The expression is valid for degenerate and nonuniformly doped substrates. A new definition of strong inversion is proposed which reduces to the definition given by Doucet and van de Wiele under nondegenerate conditions. A simplified structure is considered which allows the MOS device to be analyzed using a one-dimensional model. The role of metal-semiconductor contacts and the assumptions involved in the analysis are discussed.
Keywords :
Conductors; Contacts; Doping; Equations; Helium; Impurities; Ion implantation; MOS devices; Semiconductor process modeling; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1982.20823
Filename :
1482320
Link To Document :
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