DocumentCode :
1080309
Title :
Analysis of nonlinearities in MOS floating resistor networks
Author :
Wilson, G. ; Chan, P.K.
Author_Institution :
Sch. of Electron. Commun. & Electr. Eng., Plymouth Univ., UK
Volume :
141
Issue :
2
fYear :
1994
fDate :
4/1/1994 12:00:00 AM
Firstpage :
82
Lastpage :
88
Abstract :
Expressions for the linearised V/I characteristics of a group of floating resistor structures employing MOS transistors operating in the triode mode are presented. Mobility-degradation effects are accurately modelled and identified as the major residual distortion source in most configurations. The application of common-mode signals to the gate and substrate terminals of a single device is shown to produce a benchmark linearisation performance. Geometrical mismatches are identified as having a potentially dominant influence on the extent to which second-harmonic distortion is suppressed
Keywords :
buffer circuits; carrier mobility; field effect transistor circuits; linearisation techniques; nonlinear network analysis; resistors; MOS floating resistor network nonlinearities analysis; MOS transistors; benchmark linearisation performance; buffers; common-mode signals; gate terminals; geometrical mismatches; linearised V/I characteristics; mobility-degradation effects; residual distortion source; second-harmonic distortion suppression; substrate terminals; triode mode;
fLanguage :
English
Journal_Title :
Circuits, Devices and Systems, IEE Proceedings -
Publisher :
iet
ISSN :
1350-2409
Type :
jour
DOI :
10.1049/ip-cds:19949837
Filename :
282623
Link To Document :
بازگشت