Title :
Optical demultiplexer using a silicon echelette grating
Author :
Fujii, Yohji ; Aoyama, Koh-ichi ; Minowa, Jun-Ichiro
Author_Institution :
Nippon Telegraph and Telephone Public Corporation, Kanagawa, Japan
fDate :
2/1/1980 12:00:00 AM
Abstract :
An echelette grating is fabricated on a silicon surface by anisotropic etching. A five channel demultiplexer using this grating for a wavelength-division-multiplexing system is developed in the 0.8-μm wavelength region. The wavelength spacings are 250 Å. This system´s insertion loss for five channels is 1.4, 1.1, 1.1, 1.1, and 1.2 dB, respectively, and crosstalk levels are <-30 dB.
Keywords :
Optical diffraction gratings; Optical fiber communication; Silicon materials/devices; Wavelength-division multiplexing; Anisotropic magnetoresistance; Diffraction gratings; Etching; Fabrication; Geometrical optics; Optical fiber cables; Optical fibers; Optical surface waves; Silicon; Wavelength division multiplexing;
Journal_Title :
Quantum Electronics, IEEE Journal of
DOI :
10.1109/JQE.1980.1070454
