DocumentCode
1081246
Title
Optical demultiplexer using a silicon echelette grating
Author
Fujii, Yohji ; Aoyama, Koh-ichi ; Minowa, Jun-Ichiro
Author_Institution
Nippon Telegraph and Telephone Public Corporation, Kanagawa, Japan
Volume
16
Issue
2
fYear
1980
fDate
2/1/1980 12:00:00 AM
Firstpage
165
Lastpage
169
Abstract
An echelette grating is fabricated on a silicon surface by anisotropic etching. A five channel demultiplexer using this grating for a wavelength-division-multiplexing system is developed in the 0.8-μm wavelength region. The wavelength spacings are 250 Å. This system´s insertion loss for five channels is 1.4, 1.1, 1.1, 1.1, and 1.2 dB, respectively, and crosstalk levels are <-30 dB.
Keywords
Optical diffraction gratings; Optical fiber communication; Silicon materials/devices; Wavelength-division multiplexing; Anisotropic magnetoresistance; Diffraction gratings; Etching; Fabrication; Geometrical optics; Optical fiber cables; Optical fibers; Optical surface waves; Silicon; Wavelength division multiplexing;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/JQE.1980.1070454
Filename
1070454
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