DocumentCode :
1081320
Title :
AlGaAs/GaAs based HEMTs, inverters and ring oscillators with InGaAs and AlGaAs etch-stop layers
Author :
Ren, Fengyuan ; Pearton, S.J. ; Kopf, R.F. ; Chu, S.N.G. ; Pei, S.S.
Author_Institution :
AT&T Bell Labs., Murray Hill, NJ, USA
Volume :
27
Issue :
13
fYear :
1991
fDate :
6/20/1991 12:00:00 AM
Firstpage :
1175
Lastpage :
1177
Abstract :
Direct coupled FET logic (DCFL) inverters and 19 stage ring oscillators have been demonstrated with MBE grown AlGaAs/GaAs HEMTs using a dry-etching gate recess technology. Pseudomorphic In0.3Ga0.7As and Al0.3Ga0.7As were used as etch-stop layers for depleted mode ungated, saturated resistors and enhancement mode FETs, respectively, to achieve excellent uniformities of threshold voltage and saturation current. The maximum extrinsic transconductance of 1.2 mu m gate length devices was 289 mS/mm with 1.35 Omega mm source resistance. The logic swing and noise margins were 0.5 and 0.2 V, respectively. The propagation delay of a 19 stage ring oscillator was 31.5 ps/stage at 300 degrees C.
Keywords :
III-V semiconductors; aluminium compounds; field effect integrated circuits; gallium arsenide; high electron mobility transistors; integrated logic circuits; oscillators; 1.2 micron; 289 mS; Al 0.3Ga 0.7As; AlGaAs-GaAs; DCFL; HEMTs; In 0.3Ga 0.7As; MBE grown; depleted mode ungated; direct coupled FET logic; dry-etching gate recess technology; enhancement mode; etch-stop layers; inverters; maximum extrinsic transconductance; pseudomorphic semiconductors; ring oscillators; saturated resistors;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19910733
Filename :
132735
Link To Document :
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