DocumentCode
1081484
Title
IIIA-5 low threshold, high efficiency Ga1-x Alx As single quantum well visible diode lasers grown by metalorganic chemical vapor deposition
Author
Burnham, R.D. ; Scifres, D.R. ; Streifer, W.
Volume
29
Issue
10
fYear
1982
fDate
10/1/1982 12:00:00 AM
Firstpage
1674
Lastpage
1674
Keywords
Chemical lasers; Dielectric substrates; Epitaxial growth; Gallium arsenide; MOCVD; Monolithic integrated circuits; Optical devices; Pulsed laser deposition; Quantum well lasers; Threshold current;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1982.20957
Filename
1482454
Link To Document