DocumentCode :
1082163
Title :
Correlation between substrate and gate currents in MOSFET´s
Author :
Tam, Simon ; Ko, Ping-Keung ; Hu, Chenming ; Muller, Richard S.
Author_Institution :
University of California, Berkeley, CA
Volume :
29
Issue :
11
fYear :
1982
fDate :
11/1/1982 12:00:00 AM
Firstpage :
1740
Lastpage :
1744
Abstract :
A correlation between substrate and gate currents in MOSFET´s is described and analyzed. Both of these currents are the result of hot-electron mechanisms. Theory for these mechanisms has been applied to derive an expression for gate current in terms of substrate current and parameters that can be calculated from processing data and bias conditions. The theory is successfully applied to a series of n-channel MOSFET´s with a range of geometries and bias values.
Keywords :
Channel hot electron injection; Current measurement; Degradation; Electron traps; Geometry; Laboratories; MOSFET circuits; Physics; Threshold voltage; Transconductance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1982.21019
Filename :
1482516
Link To Document :
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