DocumentCode :
1082309
Title :
Computer analysis of DC field and current-density profiles of DAR impatt diode
Author :
Datta, D.N. ; Pati, S.P. ; Banerjee, J.P. ; Pal, B.B. ; Roy, S.K.
Author_Institution :
University of Calcutta, Calcutta, India
Volume :
29
Issue :
11
fYear :
1982
fDate :
11/1/1982 12:00:00 AM
Firstpage :
1813
Lastpage :
1816
Abstract :
A computer study on the dc field and current-density profiles of a Si n+-p-v-n-p+double avalanche region (DAR) Impatt has been carried out. With increasing current density the uniform electric field in the central drift region remains almost unaffected due to cancellation of mobile space charge, in case of symmetrically doped structure. Also the avalanche and drift-zone widths and the RF conversion efficiency remain almost unaltered. For asymmetric doping there is a small space-charge effect.
Keywords :
Current density; Diodes; Doping profiles; Electron devices; Implants; MOSFETs; Military computing; Semiconductor process modeling; Space charge; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1982.21032
Filename :
1482529
Link To Document :
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