DocumentCode :
1082574
Title :
Miniaturization of Electrostatic Fluid Accelerators
Author :
Hsu, Chih-Peng ; Jewell-Larsen, Nels E. ; Krichtafovitch, Igor A. ; Montgomery, Stephen W. ; Dibene, J. Ted ; Mamishev, Alexander V.
Author_Institution :
Washington Univ., Seattle
Volume :
16
Issue :
4
fYear :
2007
Firstpage :
809
Lastpage :
815
Abstract :
Existing thermal-management methods for electronics do not meet the technology needs and remain a major bottleneck in the evolution of computing, sensing, and information technology. The decreasing size of microelectronic components and the resulting increasing thermal output density require novel cooling solutions. Electrostatic fluid accelerators (EFAs), also known as electrohydrodynamic ionic wind pumps, have the potential of becoming a critical element of electronic thermal-management solutions. In order to take full advantage of EFA-based thermal management, it is essential to miniaturize EFA technology. This paper demonstrates the successful operation of a mesoscale microfabricated silicon EFA. Several cantilever structures fabricated in bulk silicon with radii of tip curvature ranging from 0.5 to 25 mum are used as the corona electrode. The device was fabricated using the combination of deep reactive ion etching (DRIE) and reactive ion etch (RIE) microfabrication processes. Forced convection cooling is demonstrated using infrared imaging, showing a 25degC surface temperature reduction over an actively heated substrate. The fabrication and test results of a mesoscale microfabricated EFA are presented in this paper.
Keywords :
cooling; electrohydrodynamics; micromechanical devices; sputter etching; thermal management (packaging); cantilever structures; cooling solution; corona electrode; deep reactive ion etching; electrohydrodynamic ionic wind pump; electrohydrodynamics; electrostatic fluid accelerator miniaturization; forced convection cooling; infrared imaging; microelectronic components; microfabrication process; size 0.5 mum to 25 mum; temperature 25 C; thermal output density; thermal-management method; Acceleration; Electron accelerators; Electronics cooling; Electrostatics; Etching; Information technology; Infrared heating; Ion accelerators; Microelectronics; Silicon; Electrohydrodynamic (EHD); electrostatic fluid accelerators (EFAs);
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/JMEMS.2007.899336
Filename :
4285636
Link To Document :
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