DocumentCode :
1082835
Title :
An Analytical Expression for Drain Saturation Voltage of Polycrystalline Silicon Thin-Film Transistors
Author :
Hao, Han ; Wang, Mingxiang ; Wong, Man
Author_Institution :
Soochow Univ., Suzhou
Volume :
29
Issue :
4
fYear :
2008
fDate :
4/1/2008 12:00:00 AM
Firstpage :
357
Lastpage :
359
Abstract :
A physical-based analytical expression for the drain saturation voltage VDsat of polycrystalline silicon (poly-Si) thin- film transistors (TFTs) is derived. VDsat is found to be dominated by the grain boundary potential barrier modulation effect, which can be readily estimated from the device transfer characteristic. Straightforward prediction of VDsat values at arbitrarily given gate voltages based on the proposed formula is demonstrated for both low temperature and high temperature processed poly-Si TFTs in either n- or p-type. The prediction agrees well with experimentally determined VDsat value. Derivation of the expression is based on our previously proposed analytical ON-state drain-current model for poly-Si TFTs, with no empirical factors included.
Keywords :
semiconductor device models; silicon; thin film transistors; device transfer characteristic; drain saturation voltage model; grain boundary potential barrier modulation effect; polycrystalline silicon TFT; thin-film transistors; Drain saturation voltage; output characteristic; polycrystalline silicon; thin-film transistors (TFTs);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2008.917810
Filename :
4457860
Link To Document :
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