Fabrication of low-cost and high-reflectivity bottom mirrors for Si-based micro-cavity devices

Author

Li, C.B. ; Li, H.X. ; Mao, R.W. ; Zuo, Y.H. ; Shi, W.H. ; Zhao, L. ; Luo, L.P. ; Cheng, B.W. ; Yu, J.Z. ; Wan, Q.M.

Author_Institution

State Key Lab. on Integrated Optoelectronics, Chinese Acad. of Sci., Beijing, China

Volume

40

Issue

17

fYear

2004

Firstpage

1079

Lastpage

1080

Abstract

A novel and simple way to prepare high-reflectivity bottom mirrors for Si-based micro-cavity devices is reported. The bottom mirror was deposited in the hole, which was etched from the backside of the sample by ethylenediamine-pyrocatechol-water solution with the buried SiO₂ layer in the silicon-on-insulator substrate as the etching-stop layer. The high-reflectivity of the bottom mirror deposited in the hole and the narrow full width at half maximum of the cavity formed by this method both indicate the successful preparation of the bottom mirror for Si-based micro-cavity devices.

Keywords

distributed Bragg reflectors; etching; integrated optics; microcavities; micromirrors; optical fabrication; plasma CVD; reflectivity; scanning electron microscopy; silicon compounds; thin films; 1 micron; DBR; Si based microcavity devices; SiO₂-Si; backside etching; buried SiO₂ layer; distributed Bragg reflectors; ethylenediamine pyrocatechol water solution; full width at half maximum; high reflectivity bottom mirrors; plasma CVD; scanning electron microscopy; silicon-on-insulator substrate;

fLanguage

English

Journal_Title

Electronics Letters

Publisher

iet

ISSN

0013-5194

Type

jour

DOI

10.1049/el:20045491

Filename

1327536