DocumentCode :
108302
Title :
Passive Photonic Alignment With Submicrometer Repeatability and Accuracy
Author :
van Gurp, Johan Frederik Cornelis ; Tichem, Marcel ; Staufer, Urs ; Jing Zhao
Author_Institution :
Micro & Nano Eng. Lab., Delft Univ. of Technol., Delft, Netherlands
Volume :
3
Issue :
11
fYear :
2013
fDate :
Nov. 2013
Firstpage :
1971
Lastpage :
1979
Abstract :
In this paper, we report on passive alignment with submicrometer accuracy of two photonic chips on a silicon optical bench. An effective design principle to minimize the tolerance chain is presented and applied to a case study. The chips have been successfully manufactured and an experimental setup has been made that can precisely assemble the chips and evaluate the alignment performance based on the camera images and coupling efficiency. It was demonstrated that passive alignment features defined in the waveguiding layers are robust enough to function as mechanical endstops. Subpixel image analysis of assembled chips showed that a 3σ chip-to-chip repeatability better than 500 nm can be achieved. Finally, based on optical coupling measurements, an absolute alignment accuracy of 670 nm has been concluded.
Keywords :
cameras; elemental semiconductors; integrated optics; optical couplers; optical waveguides; silicon; Si; camera images; chip-to-chip repeatability; coupling efficiency; mechanical endstops; optical coupling measurements; passive photonic alignment; photonic chips; silicon optical bench; submicrometer accuracy; submicrometer repeatability; subpixel image analysis; tolerance chain; waveguiding layers; Accuracy; Assembly; Cameras; Indium phosphide; Optical waveguides; Photonics; Silicon; Microassembly; passive alignment; photonic packaging; silicon optical bench (SiOB);
fLanguage :
English
Journal_Title :
Components, Packaging and Manufacturing Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
2156-3950
Type :
jour
DOI :
10.1109/TCPMT.2013.2272419
Filename :
6588602
Link To Document :
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