DocumentCode :
1083044
Title :
Design considerations for high performance avalanche photodiode multiplication layers
Author :
Chandramouli, V. ; Maziar, Christine M. ; Campbell, Joe C.
Author_Institution :
Dept. of Electr. & Comput. Eng., Texas Univ., Austin, TX, USA
Volume :
41
Issue :
5
fYear :
1994
fDate :
5/1/1994 12:00:00 AM
Firstpage :
648
Lastpage :
654
Abstract :
We have studied the effect of the thickness of the multiplication region on the noise performance characteristics of avalanche photodiodes (APD´s). Our simulation results are based on a full band Monte Carlo model with anisotropic threshold energies for impact ionization. Simulation results suggest that the well known McIntyre expression for the excess noise factor is not directly applicable for devices with a very thin multiplication region. Since the number of ionization events is drastically reduced when the multiplication layer is very thin, the “ionization coefficient” is not a good physical parameter to characterize the process. Instead “effective quantum yield,” which is a measure of the total electron-hole pair generation in the device, is a more appropriate parameter to consider. We also show that for the device structure considered here, modeling the excess noise factor using a “discrete Bernoulli trial” model as opposed to the conventional “continuum theory” produces closer agreement to experimental measurements. Our results reinforce the understanding that impact ionization is a strong function of carrier energy and the use of simplified field-dependent models to characterize this high energy process fails to accurately model this phenomenon
Keywords :
Monte Carlo methods; avalanche photodiodes; impact ionisation; semiconductor device models; semiconductor device noise; APD; anisotropic threshold energies; avalanche photodiode multiplication layers; carrier energy; discrete Bernoulli trial model; effective quantum yield; full band Monte Carlo model; impact ionization; ionization coefficient; multiplication region thickness; noise performance characteristics; total electron-hole pair generation; Anisotropic magnetoresistance; Avalanche photodiodes; Charge carrier processes; Impact ionization; Indium phosphide; Monte Carlo methods; Noise measurement; Optical fiber communication; Stimulated emission; Substrates;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.285011
Filename :
285011
Link To Document :
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