• DocumentCode
    1083044
  • Title

    Design considerations for high performance avalanche photodiode multiplication layers

  • Author

    Chandramouli, V. ; Maziar, Christine M. ; Campbell, Joe C.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Texas Univ., Austin, TX, USA
  • Volume
    41
  • Issue
    5
  • fYear
    1994
  • fDate
    5/1/1994 12:00:00 AM
  • Firstpage
    648
  • Lastpage
    654
  • Abstract
    We have studied the effect of the thickness of the multiplication region on the noise performance characteristics of avalanche photodiodes (APD´s). Our simulation results are based on a full band Monte Carlo model with anisotropic threshold energies for impact ionization. Simulation results suggest that the well known McIntyre expression for the excess noise factor is not directly applicable for devices with a very thin multiplication region. Since the number of ionization events is drastically reduced when the multiplication layer is very thin, the “ionization coefficient” is not a good physical parameter to characterize the process. Instead “effective quantum yield,” which is a measure of the total electron-hole pair generation in the device, is a more appropriate parameter to consider. We also show that for the device structure considered here, modeling the excess noise factor using a “discrete Bernoulli trial” model as opposed to the conventional “continuum theory” produces closer agreement to experimental measurements. Our results reinforce the understanding that impact ionization is a strong function of carrier energy and the use of simplified field-dependent models to characterize this high energy process fails to accurately model this phenomenon
  • Keywords
    Monte Carlo methods; avalanche photodiodes; impact ionisation; semiconductor device models; semiconductor device noise; APD; anisotropic threshold energies; avalanche photodiode multiplication layers; carrier energy; discrete Bernoulli trial model; effective quantum yield; full band Monte Carlo model; impact ionization; ionization coefficient; multiplication region thickness; noise performance characteristics; total electron-hole pair generation; Anisotropic magnetoresistance; Avalanche photodiodes; Charge carrier processes; Impact ionization; Indium phosphide; Monte Carlo methods; Noise measurement; Optical fiber communication; Stimulated emission; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.285011
  • Filename
    285011