DocumentCode
1083122
Title
High efficiency a-Si:H p-i-n solar cell using a SnO2 /glass substrate
Author
Iida, H. ; Shiba, N. ; Mishuku, T. ; Ito, A. ; Karasawa, H. ; Yamanaka, M. ; Hayashi, Y.
Author_Institution
Technical Laboratory, Gunma, Japan
Volume
3
Issue
5
fYear
1982
fDate
5/1/1982 12:00:00 AM
Firstpage
114
Lastpage
115
Abstract
Dependence of conversion efficiency of a-Si:H p-i-n solar cells on the material of transparent conductive film substrates was studied. Irrespective of preparation method of the transparent conductive film, SnO2 films gave an advantage over ITO films for high efficiency cell production by a parallel plate electrode type plasma C.V.D. equipment. A conversion efficiency of 7.19% was achieved by optimizing preparation conditions of the SnO2 film and the a-Si:H film.
Keywords
Conductive films; Electrodes; Glass; Indium tin oxide; Optical films; PIN photodiodes; Photovoltaic cells; Spraying; Substrates; Temperature;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1982.25503
Filename
1482608
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