• DocumentCode
    108319
  • Title

    Large-Area MgB2 Films Fabricated by Scaled-Up Hybrid Physical - Chemical Vapor Deposition

  • Author

    Teng Tan ; Chenggang Zhuang ; Krick, A. ; Ke Chen ; Xi, X.X.

  • Author_Institution
    Dept. of Phys., Temple Univ., Philadelphia, PA, USA
  • Volume
    23
  • Issue
    3
  • fYear
    2013
  • fDate
    Jun-13
  • Firstpage
    7500304
  • Lastpage
    7500304
  • Abstract
    A scaled-up hybrid physical-chemical vapor deposition (HPCVD) method has been developed to fabricate large-area high-quality magnesium diboride (MgB2) thin films. The 2-in-diameter MgB2 thin films on sapphire (0001) show uniform superconducting properties, including Tc ~ 39 K, residual-resistivity ratio ~ 14, and Jc (4.2 K) ~ 107 A/cm2. X-ray diffraction showed that the films are epitaxial with c-axis normal to the film surface. The film properties are uniform across the 2-in substrate.
  • Keywords
    X-ray diffraction; chemical vapour deposition; electrical resistivity; magnesium compounds; superconducting epitaxial layers; superconducting materials; Al2O3; MgB2; X-ray diffraction; XRD; film properties; film surface; large-area high-quality magnesium diboride thin films; residual-resistivity ratio; scaled-up hybrid physical-chemical vapor deposition method; size 2 in; superconducting properties; Conductivity; Heating; Magnetic field measurement; Substrates; Superconducting epitaxial layers; Temperature measurement; $hbox{MgB}_{2}$; Hybrid physical–chemical vapor deposition (HPCVD); superconducting films; superconducting materials;
  • fLanguage
    English
  • Journal_Title
    Applied Superconductivity, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1051-8223
  • Type

    jour

  • DOI
    10.1109/TASC.2012.2234822
  • Filename
    6397584