DocumentCode
1083231
Title
Conduction in polycrystalline silicon: Diffusion theory and extended state mobility model
Author
Kim, D.M. ; Khondker, A.N. ; Shah, R.R. ; Crosthwait, D.L., Jr.
Author_Institution
Rice University, Houston, TX, USA
Volume
3
Issue
5
fYear
1982
fDate
5/1/1982 12:00:00 AM
Firstpage
141
Lastpage
143
Abstract
We present a new model for conduction in polycrystalline silicon based on an extended state mobility in the disordered grain boundary and the diffusion theory of current. This analysis for the first time satisfactorily explains-without the use of scaling or artificial factors-experimental data on current density, mobility, resistivity, and the activation energy for carriers in polysilicon. An attractive feature of this theory is that it provides simple expressions for J, µ, and ρ which may even be derived from an equivalent circuit model. Also, these expressions reduce, within appropriate limits, to the corresponding terms for single crystal or amorphous material.
Keywords
Amorphous materials; Charge carriers; Conductivity; Crystallization; Current density; Grain boundaries; Optical scattering; Photonic band gap; Silicon; Thermionic emission;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1982.25514
Filename
1482619
Link To Document