• DocumentCode
    1083231
  • Title

    Conduction in polycrystalline silicon: Diffusion theory and extended state mobility model

  • Author

    Kim, D.M. ; Khondker, A.N. ; Shah, R.R. ; Crosthwait, D.L., Jr.

  • Author_Institution
    Rice University, Houston, TX, USA
  • Volume
    3
  • Issue
    5
  • fYear
    1982
  • fDate
    5/1/1982 12:00:00 AM
  • Firstpage
    141
  • Lastpage
    143
  • Abstract
    We present a new model for conduction in polycrystalline silicon based on an extended state mobility in the disordered grain boundary and the diffusion theory of current. This analysis for the first time satisfactorily explains-without the use of scaling or artificial factors-experimental data on current density, mobility, resistivity, and the activation energy for carriers in polysilicon. An attractive feature of this theory is that it provides simple expressions for J, µ, and ρ which may even be derived from an equivalent circuit model. Also, these expressions reduce, within appropriate limits, to the corresponding terms for single crystal or amorphous material.
  • Keywords
    Amorphous materials; Charge carriers; Conductivity; Crystallization; Current density; Grain boundaries; Optical scattering; Photonic band gap; Silicon; Thermionic emission;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1982.25514
  • Filename
    1482619