DocumentCode :
1083231
Title :
Conduction in polycrystalline silicon: Diffusion theory and extended state mobility model
Author :
Kim, D.M. ; Khondker, A.N. ; Shah, R.R. ; Crosthwait, D.L., Jr.
Author_Institution :
Rice University, Houston, TX, USA
Volume :
3
Issue :
5
fYear :
1982
fDate :
5/1/1982 12:00:00 AM
Firstpage :
141
Lastpage :
143
Abstract :
We present a new model for conduction in polycrystalline silicon based on an extended state mobility in the disordered grain boundary and the diffusion theory of current. This analysis for the first time satisfactorily explains-without the use of scaling or artificial factors-experimental data on current density, mobility, resistivity, and the activation energy for carriers in polysilicon. An attractive feature of this theory is that it provides simple expressions for J, µ, and ρ which may even be derived from an equivalent circuit model. Also, these expressions reduce, within appropriate limits, to the corresponding terms for single crystal or amorphous material.
Keywords :
Amorphous materials; Charge carriers; Conductivity; Crystallization; Current density; Grain boundaries; Optical scattering; Photonic band gap; Silicon; Thermionic emission;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1982.25514
Filename :
1482619
Link To Document :
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