DocumentCode :
1083456
Title :
Accumulation-punchthrough mode of operation of buried-channel MOSFET´s
Author :
Ratnam, P. ; Bhattacharyya, A.B.
Author_Institution :
Indian Institute of Technology, New Delhi, India
Volume :
3
Issue :
7
fYear :
1982
fDate :
7/1/1982 12:00:00 AM
Firstpage :
203
Lastpage :
204
Abstract :
The current-voltage characteristics of a buried-channel MOSFET operated in a "punchthrough-accumulation" mode, when the neutral implanted channel is completely depleted due to punchthrough by substrate bias and an accumulation layer is induced by the gate, are demonstrated. It is shown that the value of one of the device model parameters, φMS, used under the above mode of operation corresponds to the gate and the substrate rather than to the gate and the channel.
Keywords :
Channel bank filters; Current-voltage characteristics; Degradation; Equations; Large scale integration; MOSFET circuits; P-n junctions; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1982.25538
Filename :
1482643
Link To Document :
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