DocumentCode :
1083640
Title :
Temperature dependence of threshold current in (GaAl)as double-heterostructure lasers with emission wavelengths of 0.74-0.9µm
Author :
Hayakawa, Toshiro ; Yamamoto, Saburo ; Hayashi, Hiroshi ; Sakurai, Takeshi ; Hijikata, Toshiki
Author_Institution :
Sharp Corp., Nara, Japan
Volume :
17
Issue :
11
fYear :
1981
fDate :
11/1/1981 12:00:00 AM
Firstpage :
2205
Lastpage :
2210
Abstract :
The threshold-current variation with temperature has been measured for Ga1-xAlxAs double-heterostructure (DH) lasers with AlAs mole fraction in the active layer x of 0.08 and 0.2, and with several heterojunction step heights \\Delta x . The threshold-temperature coefficient Jth(350 K)/Jth(300 K), which generally increases with decreasing \\Delta x , is found to be larger for x = 0.2 than that for x = 0.08 at the same value of \\Delta x , and also to be larger for the lasers with smaller effective electron diffusion length in the P cladding layer, in the case of x = 0.2 . These characteristics are well explained by a model of carrier leakage due to unconfined carriers in the active layer. It is confirmed by a good fit of the experimental results with the calculated values that the electron leakage in the \\Gamma conduction band of the P cladding layer dominates for x \\leq 0.1 , but the hole leakage in the N cladding layer increases with x and becomes comparable in magnitude with the electron leakage at x \\sim 0.2 .
Keywords :
Gallium materials/lasers; Laser thermal factors; Charge carrier processes; Current measurement; DH-HEMTs; Laser modes; Leakage current; Length measurement; Light sources; Temperature dependence; Temperature measurement; Threshold current;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1981.1070683
Filename :
1070683
Link To Document :
بازگشت