DocumentCode :
1084051
Title :
Model for modulation doped field effect transistor
Author :
Drummond, T.J. ; Morkoc, H. ; Lee, K. ; Shur, M.
Author_Institution :
University of Illinois, Urbana, IL
Volume :
3
Issue :
11
fYear :
1982
fDate :
11/1/1982 12:00:00 AM
Firstpage :
338
Lastpage :
341
Abstract :
A model describing C-V and I-V characteristics of modulation doped FET\´s is proposed. The model takes into account the change in the Fermi energy with the gate voltage. At high two dimensional electron concentrations, the equations of the model for the charge control by the gate voltage become similar to the equations of the charge control model where the thickness d of AlGaAs layer should be substituted by d + Δ d and Δ d is the effective width of the potential well (≃ 80 Å). Another important prediction of the model is the existence of the "subthreshold" current. A very good quantitative agreement is obtained with our experimental I-V curves using the measured values of the low field mobility and the source resistance.
Keywords :
Capacitance-voltage characteristics; Electrons; Epitaxial layers; Equations; FETs; Potential well; Predictive models; Subthreshold current; Thickness control; Voltage control;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1982.25593
Filename :
1482698
Link To Document :
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