Title :
Silicon shadow mask preparation by vertical preferential etching
Author :
Roenker, K.P. ; Ikossi-Anastasiou, K. ; Ikossi-Anastasiou, K.
Author_Institution :
University of Cincinnati, Cincinnati, OH
fDate :
12/1/1982 12:00:00 AM
Abstract :
Silicon shadow masks were prepared by vertical etching
Keywords :
Anisotropic magnetoresistance; Costs; Etching; Geometry; Machining; Photovoltaic cells; Propellants; Shape; Silicon; Temperature;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1982.25620
