• DocumentCode
    1084898
  • Title

    Design model for bulk CMOS scaling enabling accurate latchup prediction

  • Author

    Wieder, Armin W. ; Werner, Christoph ; Harter, Johann

  • Author_Institution
    Siemens AG, Munich, Federal Republic of Germany
  • Volume
    30
  • Issue
    3
  • fYear
    1983
  • fDate
    3/1/1983 12:00:00 AM
  • Firstpage
    240
  • Lastpage
    245
  • Abstract
    The integration density of advanced bulk CMOS structures heavily depends on SCR type of latch up. Depending on the technology chosen the n-p-n-p-n-p interaction, which can be fired by noise, destroys tile stored information or even the chip itself. This paper presents the first complete two-dimensional numerical analysis for a typical CMOS structure including latchup path in the "OFF," "ON," "firing" and "sustaining" mode. Results and experimental data are discussed and used to develop a simplified, yet accurate CMOS design model. This allows the calculation of the firing and sustaining edge depending on geometrical and processing data.
  • Keywords
    CMOS process; CMOS technology; Charge carrier processes; Doping; Poisson equations; Predictive models; Semiconductor device modeling; Thyristors; Two dimensional displays; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1983.21107
  • Filename
    1483008