• DocumentCode
    108556
  • Title

    Efficiency-Droop Suppression by Using Large-Bandgap AlGaInN Thin Barrier Layers in InGaN Quantum-Well Light-Emitting Diodes

  • Author

    Guangyu Liu ; Jing Zhang ; Chee Keong Tan ; Tansu, N.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Lehigh Univ., Bethlehem, PA, USA
  • Volume
    5
  • Issue
    2
  • fYear
    2013
  • fDate
    Apr-13
  • Firstpage
    2201011
  • Lastpage
    2201011
  • Abstract
    The electrical and optical characteristics of InGaN quantum-well light-emitting diodes with large-bandgap AlGaInN thin barriers were analyzed with the consideration of carrier transport effect for efficiency droop suppression. The lattice-matched AlGaInN quaternary alloys with different compositions, thicknesses, and positions were employed as thin barrier layers (1-2 nm) surrounding the InGaN QW in LED structures. The increased effective barrier heights of AlGaInN thin barrier led to suppression of carrier leakage as compared to conventional InGaN QW LEDs with GaN barrier only. The current work provides a comprehensive simulation taking into consideration the carrier transport in self-consistent manner, and the finding indicated the use of thin layers of AlGaInN or AlInN barriers as sufficient for suppressing the droop in InGaN-based QW LEDs. The efficiency of InGaN QW LED with the insertion of lattice-matched Al0.82In0.18N thin barrier layers showed the least droop phenomenon at high current density among the investigated LEDs. The thickness study indicated that a thin layer (<; 2 nm) of large-bandgap material in the barrier region was sufficient for efficiency droop suppression.
  • Keywords
    III-V semiconductors; aluminium compounds; carrier mobility; gallium compounds; indium compounds; light emitting diodes; quantum well devices; wide band gap semiconductors; AlGaInN; InGaN; carrier leakage suppression; carrier transport effect; effective barrier height; efficiency-droop suppression; electrical characteristics; large bandgap thin barrier layers; optical characteristics; quantum well light emitting diodes; quaternary alloys; size 1 nm to 2 nm; Charge carrier processes; Current density; Gallium nitride; Light emitting diodes; Materials; Metals; Radiative recombination; Efficiency droop; III-nitride; InGaN quantum wells (QWs); internal quantum efficiency (IQE); light-emitting diodes (LEDs); thin barrier design;
  • fLanguage
    English
  • Journal_Title
    Photonics Journal, IEEE
  • Publisher
    ieee
  • ISSN
    1943-0655
  • Type

    jour

  • DOI
    10.1109/JPHOT.2013.2255028
  • Filename
    6488705