DocumentCode
1085728
Title
Reduction of leakage current of 4H-SIC pin diodes after UV light exposure
Author
Wolborski, M. ; Bakowski, M. ; Schöner, A.
Author_Institution
Dept. of Microelectron. & Appl. Phys., R. Inst. of Technol., Kista
Volume
43
Issue
2
fYear
2007
Firstpage
130
Lastpage
131
Abstract
A substantial reduction of the leakage current in 4H-SiC pin diodes is observed after <10 eV UV irradiation in air. The high energy UV is believed to remove carbon clusters from the SiC surface. Comparison of leakage current in 4H-SiC pin diodes after different surface treatments, including reactive ion etching, exposure to two different sources of UV light and different forms of chemical cleaning, is presented. Exposure to 4.9 eV UV light in nitrogen atmosphere enhances the leakage by one order of magnitude
Keywords
leakage currents; p-i-n diodes; silicon compounds; ultraviolet radiation effects; 4.9 eV; 4H-SiC; SiC; UV irradiation; UV light exposure; chemical cleaning; leakage current reduction; pin diodes; reactive ion etching; surface treatments;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20073494
Filename
4084126
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