• DocumentCode
    1085728
  • Title

    Reduction of leakage current of 4H-SIC pin diodes after UV light exposure

  • Author

    Wolborski, M. ; Bakowski, M. ; Schöner, A.

  • Author_Institution
    Dept. of Microelectron. & Appl. Phys., R. Inst. of Technol., Kista
  • Volume
    43
  • Issue
    2
  • fYear
    2007
  • Firstpage
    130
  • Lastpage
    131
  • Abstract
    A substantial reduction of the leakage current in 4H-SiC pin diodes is observed after <10 eV UV irradiation in air. The high energy UV is believed to remove carbon clusters from the SiC surface. Comparison of leakage current in 4H-SiC pin diodes after different surface treatments, including reactive ion etching, exposure to two different sources of UV light and different forms of chemical cleaning, is presented. Exposure to 4.9 eV UV light in nitrogen atmosphere enhances the leakage by one order of magnitude
  • Keywords
    leakage currents; p-i-n diodes; silicon compounds; ultraviolet radiation effects; 4.9 eV; 4H-SiC; SiC; UV irradiation; UV light exposure; chemical cleaning; leakage current reduction; pin diodes; reactive ion etching; surface treatments;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20073494
  • Filename
    4084126