• DocumentCode
    1085799
  • Title

    An analytic characterization of weak-inversion drift current in a long-channel MOSFET

  • Author

    Lim, Hyung-Kyu ; Fossum, Jerry G.

  • Author_Institution
    University of Florida, Gainesville, FL
  • Volume
    30
  • Issue
    6
  • fYear
    1983
  • fDate
    6/1/1983 12:00:00 AM
  • Firstpage
    713
  • Lastpage
    715
  • Abstract
    A weak-inversion drain-current model that accounts for both drift and diffusion of carriers in a long-channel MOSFET is derived. The drift current increases exponentially with surface potential, and for typical silicon MOSFET´s the drift-diffusion current ratio is about 0.2 at threshold. From the model a simple analytic threshold current expression is obtained that facilitates a quick experimental determination of the threshold voltage.
  • Keywords
    Argon; Etching; Gallium arsenide; MOSFET circuits; Milling; Mirrors; Nitrogen; Semiconductor lasers; Surface contamination; Threshold current;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1983.21195
  • Filename
    1483096