DocumentCode
1085799
Title
An analytic characterization of weak-inversion drift current in a long-channel MOSFET
Author
Lim, Hyung-Kyu ; Fossum, Jerry G.
Author_Institution
University of Florida, Gainesville, FL
Volume
30
Issue
6
fYear
1983
fDate
6/1/1983 12:00:00 AM
Firstpage
713
Lastpage
715
Abstract
A weak-inversion drain-current model that accounts for both drift and diffusion of carriers in a long-channel MOSFET is derived. The drift current increases exponentially with surface potential, and for typical silicon MOSFET´s the drift-diffusion current ratio is about 0.2 at threshold. From the model a simple analytic threshold current expression is obtained that facilitates a quick experimental determination of the threshold voltage.
Keywords
Argon; Etching; Gallium arsenide; MOSFET circuits; Milling; Mirrors; Nitrogen; Semiconductor lasers; Surface contamination; Threshold current;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1983.21195
Filename
1483096
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