Title :
Laser-induced oxidation via oxygen-trapping in UV laser-induced amorphous silicon
Author :
Liu, Yanbing ; Chiang, S. ; Bacon, F.
Author_Institution :
General Electric Res. and Dev. Center, NY, USA
fDate :
12/1/1981 12:00:00 AM
Keywords :
Amorphous silicon; Annealing; Electrons; Frequency; Indium phosphide; Laser theory; Masers; Optical pulse generation; Optical pulses; Oxidation;
Journal_Title :
Quantum Electronics, IEEE Journal of
DOI :
10.1109/JQE.1981.1070931
