Fabrication of Photonic Ring Resonator Device in Silicon Waveguide Technology Using Soft UV-Nanoimprint Lithography

Author

Plachetka, U. ; Koo, N. ; Wahlbrink, T. ; Bolten, J. ; Waldow, M. ; Plötzing, T. ; Först, M. ; Kurz, H.

Author_Institution

Adv. Microelectron. Center Aachen (AMICA), Aachen

Volume

20

Issue

7

fYear

2008

fDate

4/1/2008 12:00:00 AM

Firstpage

490

Lastpage

492

Abstract

We report on an innovative fabrication method for high-quality resonant photonic devices on silicon-on-insulator substrates with quality (Q)-factor of 47 700 and propagation losses of 3.5 dB/cm. The definition of a resonator device using soft ultraviolet-nanoimprint lithography is detailed followed by description of an adapted structure transfer process. Spectral response measurements and propagation loss analysis were carried out evidencing the functionality of the fabricated resonator.

Keywords

nanolithography; optical fabrication; optical losses; optical resonators; optical waveguides; silicon; silicon-on-insulator; soft lithography; Si; photonic ring resonator; propagation loss analysis; quality-factor; silicon waveguide technology; soft ultraviolet-nanoimprint lithography; Lithography; Optical device fabrication; Optical resonators; Optical ring resonators; Optical surface waves; Optical waveguides; Photonics; Polymers; Silicon on insulator technology; Substrates; Integrated optics; lithography; nanoimprint; photonics; resonator;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2008.918386

Filename

4459736