• DocumentCode
    1086951
  • Title

    Accurate modeling for submicrometer-gate Si and GaAs MESFET´s using two-dimensional particle simulation

  • Author

    Yoshi, Akira ; Tomizawa, Masaaki ; Yokoyama, Kiyoyuki

  • Author_Institution
    Nippon Telegraph and Telephone Public Corporation, Kanagawa, Japan
  • Volume
    30
  • Issue
    10
  • fYear
    1983
  • fDate
    10/1/1983 12:00:00 AM
  • Firstpage
    1376
  • Lastpage
    1380
  • Abstract
    Device characteristics, including nonstationary carrier-transport effects such as velocity overshoot phenomena in submicrometergate Si and GaAs MESFET´s, are presented in detail by two-dimensional full Monte Carlo particle simulation. Accurate current-voltage characteristics and transient current response are successfully obtained without relaxation time approximation. Moreover, the carrier dynamics influence on device operation is clarified in a realistic device model, compared with the conventional simulation. It can be pointed out that such nonstationary carrier transport is acutely important for accurate modeling of submicrometer-gate GaAs MESFET´s, but is not as important for that of Si MESFET´s.
  • Keywords
    Approximation methods; Fabrication; Gallium arsenide; Impurities; MESFETs; Monte Carlo methods; Particle scattering; Poisson equations; Telegraphy; Very large scale integration;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1983.21302
  • Filename
    1483203