DocumentCode
1086951
Title
Accurate modeling for submicrometer-gate Si and GaAs MESFET´s using two-dimensional particle simulation
Author
Yoshi, Akira ; Tomizawa, Masaaki ; Yokoyama, Kiyoyuki
Author_Institution
Nippon Telegraph and Telephone Public Corporation, Kanagawa, Japan
Volume
30
Issue
10
fYear
1983
fDate
10/1/1983 12:00:00 AM
Firstpage
1376
Lastpage
1380
Abstract
Device characteristics, including nonstationary carrier-transport effects such as velocity overshoot phenomena in submicrometergate Si and GaAs MESFET´s, are presented in detail by two-dimensional full Monte Carlo particle simulation. Accurate current-voltage characteristics and transient current response are successfully obtained without relaxation time approximation. Moreover, the carrier dynamics influence on device operation is clarified in a realistic device model, compared with the conventional simulation. It can be pointed out that such nonstationary carrier transport is acutely important for accurate modeling of submicrometer-gate GaAs MESFET´s, but is not as important for that of Si MESFET´s.
Keywords
Approximation methods; Fabrication; Gallium arsenide; Impurities; MESFETs; Monte Carlo methods; Particle scattering; Poisson equations; Telegraphy; Very large scale integration;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1983.21302
Filename
1483203
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