Title :
Ultrafine motion detection of micromechanical structures using optical moire patterns
Author :
Tran, A.T.T.D. ; Lee, J.J. ; Zhang, K. ; Lo, Y.H.
Author_Institution :
Dept. of Appl. & Eng. Phys., Cornell Univ., Ithaca, NY, USA
Abstract :
The use of optical moire patterns for motion and microtribology detection of micromechanical devices has been proposed and demonstrated. Using a very simple image processing technique, 50-nm in-plane motion of a micromechanical sensor has been detected. With an improved device design, the spatial resolution for in-plane motion detection will be able to reach 10 nm, meeting the most stringent requirement for any known applications for microelectromechanical systems (MEMS).
Keywords :
image processing; light interferometry; mechanical variables measurement; micromechanical devices; moire fringes; object detection; optical noise; optical sensors; tribology; CCD image sensors; microelectromechanical systems; micromechanical structures; microtribology detection; motion detection; optical moire patterns; ultrafine motion detection; Background noise; Electron optics; Friction; Gratings; Micromechanical devices; Motion detection; Optical devices; Optical microscopy; Optical sensors; Scanning electron microscopy;
Journal_Title :
Photonics Technology Letters, IEEE
