DocumentCode
1087040
Title
Dark current suppression in GaAs metal-semiconductor-metal photodetectors
Author
Wohlmuth, W.A. ; Fay, P. ; Adesida, I.
Author_Institution
Center for Compound Semicond. Microelectron., Illinois Univ., Urbana, IL, USA
Volume
8
Issue
8
fYear
1996
Firstpage
1061
Lastpage
1063
Abstract
We demonstrate a novel technique for decreasing the dark current in GaAs and AlGaAs-GaAs metal-semiconductor-metal (MSM) photodetectors without compromising the responsivity or the bandwidth. This technique involves the placement of the electrode tips and the contact pads on top of an insulating layer of silicon nitride to eliminate parasitic leakage paths and high electric field regions near the tips of the electrodes. For GaAs devices biased at 5 V with a 50×50-μm2 active area and 3-μm electrode spacing and width, the dark current was reduced from 48.8 to 2.49 nA and the noise equivalent power was reduced from 119 to 26.9 nW. For similar AlGaAsGaAs devices, the dark current was reduced from 1.6 to 0.3 nA and the noise equivalent power was reduced from 19.2 to 8.12 nW.
Keywords
III-V semiconductors; dark conductivity; electrodes; gallium arsenide; integrated optics; photodetectors; semiconductor-metal boundaries; /spl mu/m electrode; 19.2 to 8.12 nW; 48.8 to 2.49 nA; 5 V; 50 mum; AlGaAs-GaAs; AlGaAs-GaAs MSM photodetectors; AlGaAsGaAs devices; GaAs; GaAs devices; GaAs metal-semiconductor-metal photodetectors; SiN; active area; bandwidth; contact pads; dark current; dark current suppression; electrode tips; electrodes; high electric field regions; insulating layer; noise equivalent power; parasitic leakage paths; responsivity; silicon nitride; Absorption; Dark current; Electrodes; Frequency response; Gallium arsenide; Optical noise; Photodetectors; Semiconductor device noise; Signal to noise ratio; Silicon;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/68.508738
Filename
508738
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