Title :
High-Efficiency Silicon-Based Envelope-Tracking Power Amplifier Design With Envelope Shaping for Broadband Wireless Applications
Author :
Ruili Wu ; Yen-Ting Liu ; Lopez, J. ; Schecht, Cliff ; Yan Li ; Lie, D.Y.C.
Author_Institution :
Dept. of Electr. & Comput. Eng., Texas Tech Univ., Lubbock, TX, USA
Abstract :
This paper presents a highly efficient silicon-based envelope-tracking power amplifier (ET-PA) for broadband wireless applications. A pseudo-differential power amplifier (PA) is designed using two integrated SiGe power cells fabricated in a 0.35- μm SiGe BiCMOS technology with through-silicon-via (TSV). In the continuous-wave (CW) measurement, the PA achieves a saturated output power (POUT) of around 2 W with power-added efficiency (PAE) above 65% across the bandwidth of 0.7-1.0 GHz. To optimize the ET-PA system performance, several envelope shaping methods such as dc shifting, envelope scaling, envelope clipping, and envelope attenuation at back-off have been investigated carefully. A highly efficient monolithic CMOS envelope modulator (EM) integrated circuit (IC) is designed in a 0.35- μm bipolar-CMOS-DMOS (BCD) process to mate with our SiGe PA. With the LTE 16 QAM 5/10/20-MHz input signals, our ET-PA system achieves around 28 dBm linear POUT, passing the stringent LTE linearity specs such as the spectrum emission mask with an average composite system PAE of 42.3%/41.1%/40.2%, respectively. No predistortion is applied in this work.
Keywords :
BiCMOS analogue integrated circuits; Ge-Si alloys; Long Term Evolution; UHF power amplifiers; bipolar MMIC; differential amplifiers; field effect MMIC; modulators; three-dimensional integrated circuits; BiCMOS technology; DC shifting; LTE 16 QAM input signal; SiGe; bipolar-CMOS-DMOS process; broadband wireless application; continuous wave measurement; envelope attenuation; envelope clipping; envelope scaling; envelope shaping; envelope tracking power amplifier; frequency 0.7 GHz to 1 GHz; monolithic CMOS envelope modulator; power cell; pseudodifferential power amplifier; saturated output power; size 0.35 mum; through silicon via; Gain; Linearity; Modulation; Peak to average power ratio; Radio frequency; Silicon germanium; Through-silicon vias; Envelope-tracking (ET); SiGe power amplifier (SiGe PA); envelope modulator (EM); envelope shaping method; long-term evolution (LTE); through-silicon-via (TSV);
Journal_Title :
Solid-State Circuits, IEEE Journal of
DOI :
10.1109/JSSC.2013.2265501