DocumentCode :
1088538
Title :
On the current-voltage characteristics of n+-p-p+diodes
Author :
Chuang, C.T.
Author_Institution :
IBM Thomas J. Watson Research Center, Yorktown Heights, NY
Volume :
30
Issue :
12
fYear :
1983
fDate :
12/1/1983 12:00:00 AM
Firstpage :
1709
Lastpage :
1716
Abstract :
The J-V characteristics of n+-p-p+diodes are analyzed based on the assumption of negligible recombination in the lowly-doped base. The analysis represents a generalization of the approach used by Mertens et al. [1] for high-injection conditions and is valid for all injection levels. Two coupled nonlinear equations from which the J-V characteristics can be calculated are derived. It is shown that under high-injection conditions the equations reduce to those by Mertens et al. For low-injection conditions the electron current density Jnand hole current density Jpare decoupled and single equations are obtained for Jnand Jp, respectively. For the case where the back side contact approaches an ohmic contact, the classical equation for a short-base diode results. The analysis is justified by very close correspondence with exact numerical calculations using the Finite Element Device Analysis Program (FIELDAY).
Keywords :
Current density; Current-voltage characteristics; Diodes; Doping; Electrons; Nonlinear equations; P-n junctions; Silicon; Space charge; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1983.21435
Filename :
1483336
Link To Document :
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