DocumentCode :
1088626
Title :
Effect of illumination wavelength and intensity on minority-carrier diffusion length of EFG silicon ribbon solar cells
Author :
Shimokawa, Ryuichi ; Hayashi, Yutaka
Author_Institution :
Electrotechnical Laboratory, Ibaraki, Japan
Volume :
30
Issue :
12
fYear :
1983
fDate :
12/1/1983 12:00:00 AM
Firstpage :
1770
Lastpage :
1775
Abstract :
Local spectral photoresponses of the edge-defined film-fed growth technique (EFG) ribbon solar cells were measured as a function of the bias light wavelength and intensity. The minority-carrier diffusion length estimated from the spectral response measurement of the short-circuit current (JSc) was found to increase semilogarithmically with the intensity at various bias light wavelengths, and to increase with the bias fight wavelength for the constant intensity in the position with a medium diffusion length (≃20 µm). In the position with a longer (≃89 µm) or shorter (≃7 µm) diffusion length, the bias light wavelength, however, had a smaller influence on the diffusion length. The effect of the bias light wavelength and intensity on the diffusion length is theoretically explained by a model of filling deep traps by photo-injected minority carriers.
Keywords :
Integrated circuit technology; Length measurement; Lighting; Metal-insulator structures; Photovoltaic cells; Physics; Plasma properties; Silicon; Very large scale integration; Wavelength measurement;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1983.21443
Filename :
1483344
Link To Document :
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