DocumentCode
1088695
Title
(InAs)1/(GaAs)4 superlattice strained quantum well laser at 980 nm
Author
Chand, Naresh ; Dutta, N.K. ; Chu, S.N.G. ; Lopata, J.
Author_Institution
AT&T Bell Labs., Murray Hill, NJ, USA
Volume
27
Issue
22
fYear
1991
Firstpage
2009
Lastpage
2011
Abstract
The first successful MBE growth of (InAs)1/(GaAs)4 short-period superlattice (SPS) strained quantum well lasers emitting at approximately 980 nm is reported. The SPS consists of six periods of one and four monolayers of InAs and GaAs, respectively. The measured threshold current density was approximately 100 A cm-2 for 0.96 mm long lasers. Devices have operated up to 170 degrees C with a characteristic temperature T0 of 148 K. The (InAs)m/(GaAs)n superlattice is an ordered counterpart of the InGaAs random alloy, and provides an alternative method fabricating high speed electronic and photonic devices.
Keywords
III-V semiconductors; gallium arsenide; indium compounds; molecular beam epitaxial growth; semiconductor epitaxial layers; semiconductor growth; semiconductor quantum wells; semiconductor superlattices; 980 nm; III-V semiconductors; InAs-GaAs; MBE growth; characteristic temperature; short-period superlattice; strained quantum well lasers; threshold current density;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19911244
Filename
132959
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