DocumentCode :
1088870
Title :
Flat surface circular buried heterostructure surface emitting laser with highly reflective Si/SiO2 mirrors
Author :
Oshikiri, M. ; Koyama, Fumio ; Iga, Kenichi
Author_Institution :
Precision & Intelligence Lab., Tokyo Inst. of Technol., Yokohama, Japan
Volume :
27
Issue :
22
fYear :
1991
Firstpage :
2038
Lastpage :
2039
Abstract :
The threshold has been reduced and +0.2 degrees C pulsed operation (Ith=150 mA) has been obtained for a flat surface buried heterostructure 1.3 mu m surface emitting laser. An in situ optical thickness monitor system was introduced into an electron beam evaporator to improve the optical thickness accuracy. 98-99% reflectivities have been obtained in Si/SiO2 multilayer reflectors.
Keywords :
laser cavity resonators; mirrors; semiconductor junction lasers; 1.3 micron; 150 mA; 98 to 99 percent; Si-SiO 2 multilayer mirrors; buried heterostructure surface emitting laser; electron beam evaporator; flat surface circular buried heterostructure; highly reflective mirrors; in situ optical thickness monitor system; optical thickness accuracy; pulsed operation; reflectivities; surface emitting laser;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19911262
Filename :
132977
Link To Document :
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