Title :
Contrast enhanced photolithography
Author :
Griffing, B.F. ; West, P.R.
Author_Institution :
General Electric Corporate Research Laboratory, Schenectady, NY
fDate :
1/1/1983 12:00:00 AM
Abstract :
This paper introduces a new method, contrast enhancement, which improves the imaging properties of conventional photoresist through the use of a photobleachable layer applied to the resist surface. Contrast enhancement allows high contrast photopatterns to be formed even when low contrast illumination is used. A short discussion of the theory and an experimental demonstration of the method are presented.
Keywords :
Circuits; Frequency; Lighting; Lithography; Optical imaging; Optical materials; Photobleaching; Resists; Spatial resolution; Transfer functions;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1983.25629
