DocumentCode :
1088943
Title :
Dependence of base crowding effect on base doping and thickness for Npn AlGaAs/GaAs HBTs
Author :
Liu, Wenxin ; Harris, J.S.
Author_Institution :
Solid State Lab., Stanford Univ., CA, USA
Volume :
27
Issue :
22
fYear :
1991
Firstpage :
2048
Lastpage :
2050
Abstract :
The dependence of the base current crowding effect on base doping level and thickness in Npn AlGaAs/GaAs heterojunction bipolar transistors is examined. In contrast to the intuitive view that the base current crowding effect should decrease when the base resistivity is reduced by either/or both increasing base doping level or thickness, it is demonstrated that the base current crowding effect actually becomes more severe. The physical cause for this phenomenon is described. The effective emitter width as a function of device geometry for various base doping levels and thicknesses is also calculated.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; heterojunction bipolar transistors; semiconductor device models; AlGaAs-GaAs; HBTs; Npn transistors; base current crowding effect; base doping; base thickness; device geometry; effective emitter width; heterojunction bipolar transistors; physical cause; semiconductors;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19911271
Filename :
132984
Link To Document :
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