DocumentCode
1088943
Title
Dependence of base crowding effect on base doping and thickness for Npn AlGaAs/GaAs HBTs
Author
Liu, Wenxin ; Harris, J.S.
Author_Institution
Solid State Lab., Stanford Univ., CA, USA
Volume
27
Issue
22
fYear
1991
Firstpage
2048
Lastpage
2050
Abstract
The dependence of the base current crowding effect on base doping level and thickness in Npn AlGaAs/GaAs heterojunction bipolar transistors is examined. In contrast to the intuitive view that the base current crowding effect should decrease when the base resistivity is reduced by either/or both increasing base doping level or thickness, it is demonstrated that the base current crowding effect actually becomes more severe. The physical cause for this phenomenon is described. The effective emitter width as a function of device geometry for various base doping levels and thicknesses is also calculated.
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; heterojunction bipolar transistors; semiconductor device models; AlGaAs-GaAs; HBTs; Npn transistors; base current crowding effect; base doping; base thickness; device geometry; effective emitter width; heterojunction bipolar transistors; physical cause; semiconductors;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19911271
Filename
132984
Link To Document