• DocumentCode
    1088943
  • Title

    Dependence of base crowding effect on base doping and thickness for Npn AlGaAs/GaAs HBTs

  • Author

    Liu, Wenxin ; Harris, J.S.

  • Author_Institution
    Solid State Lab., Stanford Univ., CA, USA
  • Volume
    27
  • Issue
    22
  • fYear
    1991
  • Firstpage
    2048
  • Lastpage
    2050
  • Abstract
    The dependence of the base current crowding effect on base doping level and thickness in Npn AlGaAs/GaAs heterojunction bipolar transistors is examined. In contrast to the intuitive view that the base current crowding effect should decrease when the base resistivity is reduced by either/or both increasing base doping level or thickness, it is demonstrated that the base current crowding effect actually becomes more severe. The physical cause for this phenomenon is described. The effective emitter width as a function of device geometry for various base doping levels and thicknesses is also calculated.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; heterojunction bipolar transistors; semiconductor device models; AlGaAs-GaAs; HBTs; Npn transistors; base current crowding effect; base doping; base thickness; device geometry; effective emitter width; heterojunction bipolar transistors; physical cause; semiconductors;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19911271
  • Filename
    132984