DocumentCode :
1089195
Title :
A corrugated capacitor cell (CCC) for megabit dynamic MOS memories
Author :
Sunami, H. ; Kure, T. ; Hashimoto, N. ; Itoh, K. ; Toyabe, T. ; Asai, S.
Author_Institution :
Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo, Japan
Volume :
4
Issue :
4
fYear :
1983
fDate :
4/1/1983 12:00:00 AM
Firstpage :
90
Lastpage :
91
Abstract :
A new dRAM cell named "CCC" (Corrugated Capacitor Cell) has been successfully developed based on the one-device cell concept. This CCC is characterized by an etched-moat storage-capacitor extended into the substrate, resulting in an almost independent increase in storage capacitance without cell size enlargement. A typical value of 45 fF has been obtained with 4 × 8 µm2CCC having a 2.5-µm deep moat and a capacitor insulator equivalent to 15 nm SiO2in thickness. A signal of 200 mV is realized in 32 kbit dRAM operation with a folded-bit line arrangement having 128 bit identical CCC\´s. The CCC concept is promising for generations of 1 Mbit dRAM\´s and beyond.
Keywords :
Alpha particles; Capacitance; Dry etching; Electronics packaging; Electrons; Insulation; MOS capacitors; Sputter etching; Substrates; Wet etching;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1983.25659
Filename :
1483403
Link To Document :
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