• DocumentCode
    1089564
  • Title

    InGaAs double heterojunction bipolar transistors grown on GaAs substrates

  • Author

    Ito, H. ; Harris, James S.

  • Author_Institution
    Stanford Univ., CA, USA
  • Volume
    28
  • Issue
    7
  • fYear
    1992
  • fDate
    3/26/1992 12:00:00 AM
  • Firstpage
    655
  • Lastpage
    656
  • Abstract
    Lattice mismatched InGaAs double heterojunction bipolar transistors were fabricated on a GaAs substrate for the first time. A current gain of 20 was achieved with a base doping of 1019/cm3 in spite of the existence of a relatively high dislocation density.
  • Keywords
    III-V semiconductors; gallium arsenide; heterojunction bipolar transistors; indium compounds; semiconductor epitaxial layers; semiconductor growth; GaAs substrate; HBT; InGaAs; InGaAs-GaAs; base doping; current gain; double heterojunction bipolar transistors; high dislocation density; lattice mismatched heterojunctions; semiconductors;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19920414
  • Filename
    133051