DocumentCode
1089587
Title
Plasma Electrode Bias Effect on the
Negative-Ion Density in an Electron Cyclotron Resonance Volume Source
Author
Svarnas, Panagiotis ; Breton, Jacques ; Bacal, Marthe ; Faulkner, Ronan
Author_Institution
Centre Nat. de la Recherche Sci., Marcoussis
Volume
35
Issue
4
fYear
2007
Firstpage
1156
Lastpage
1162
Abstract
The role of the plasma electrode (PE) bias in the extraction process in a large-volume hybrid multicusp negative-ion source, which is driven by 2.45-GHz microwaves, is studied. Spatially resolved negative-ion and electron density measurements close to the extractor aperture were performed under various pressures (1-4 mtorr) by means of the electrostatic probe and photodetachment technique. As the low positive voltage applied to the PE is slightly increased (from 4 to 7 V), the electron temperature passes through a minimum (0.2-0.6 eV), while simultaneously, both the negative-ion density and the H extracted current reach a maximum (~1-2 times 109 cm-3 and ~0.5 mA/cm2, respectively). Optimum pressure values for the extracted negative-ion current and the negative-ion density are found between ~1.5 and 3 mtorr. It is deduced that the negative-ion density measured in the center of the source cannot be directly correlated with the ion extracted current. The electron density and the associated extracted electron current linearly decrease as a function of the PE bias. The physical mechanisms explaining the experimental results are discussed.
Keywords
hydrogen ions; ion sources; negative ions; plasma density; plasma probes; plasma temperature; H-; H- ion density; electron cyclotron resonance volume source; electron density; electron temperature; electron volt energy 0.2 eV to 0.6 eV; electrostatic probe; extractor aperture; frequency 2.45 GHz; hybrid multicusp negative-ion source; hydrogen negative-ion density; photodetachment technique; plasma electrode bias effect; pressure 1 mtorr to 4 mtorr; voltage 4 V; voltage 7 V; Apertures; Density measurement; Electrodes; Electrons; Electrostatics; Performance evaluation; Plasma density; Plasma measurements; Plasma sources; Spatial resolution; Electrostatic probe; hydrogen; microwaves; negative ions; photodetachment; plasma electrode (PE) bias;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2007.902122
Filename
4287088
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