DocumentCode :
1089615
Title :
A direct comparison of LEC GaAs grown using low- and high-pressure techniques
Author :
Duncan, W.M. ; Westphal, G.H. ; Sherer, J.B.
Author_Institution :
Texas Instruments, Inc., Dallas, TX
Volume :
4
Issue :
6
fYear :
1983
fDate :
6/1/1983 12:00:00 AM
Firstpage :
199
Lastpage :
201
Abstract :
A direct comparison has been made between the properties and implant behavior of undoped semi-insulating (SI) low- and high-pressure liquid encapsulated Czochralski (LEC) GaAs. Although the properties of high-pressure LEC had previously been well characterized, this is the first detailed study of the quality of low-pressure LEC material. It is shown that both material types are similar in structural quality, purity, and in the characteristics of conducting layers formed by direct ion implantation. Arsenic-rich melts and B2O3with greater than 500-ppm H2O content are required for obtaining reproducible and stable SI behavior growing from quartz crucibles.
Keywords :
Annealing; Conducting materials; Crystalline materials; Crystals; Gallium arsenide; Implants; Ion implantation; Pressure control; Silicon compounds; Temperature;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1983.25703
Filename :
1483447
Link To Document :
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