• DocumentCode
    1089615
  • Title

    A direct comparison of LEC GaAs grown using low- and high-pressure techniques

  • Author

    Duncan, W.M. ; Westphal, G.H. ; Sherer, J.B.

  • Author_Institution
    Texas Instruments, Inc., Dallas, TX
  • Volume
    4
  • Issue
    6
  • fYear
    1983
  • fDate
    6/1/1983 12:00:00 AM
  • Firstpage
    199
  • Lastpage
    201
  • Abstract
    A direct comparison has been made between the properties and implant behavior of undoped semi-insulating (SI) low- and high-pressure liquid encapsulated Czochralski (LEC) GaAs. Although the properties of high-pressure LEC had previously been well characterized, this is the first detailed study of the quality of low-pressure LEC material. It is shown that both material types are similar in structural quality, purity, and in the characteristics of conducting layers formed by direct ion implantation. Arsenic-rich melts and B2O3with greater than 500-ppm H2O content are required for obtaining reproducible and stable SI behavior growing from quartz crucibles.
  • Keywords
    Annealing; Conducting materials; Crystalline materials; Crystals; Gallium arsenide; Implants; Ion implantation; Pressure control; Silicon compounds; Temperature;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1983.25703
  • Filename
    1483447