Title :
New UV laser transitions of sulfur and oxygen
Author :
Chiu, M.S. ; Chou, C.C.
Author_Institution :
Shanghai Institute of Laser Technology, Yue Yang Road, Shanghai, China
fDate :
9/1/1981 12:00:00 AM
Abstract :
Three new UV laser lines, S III 363.2 nm and O II 397.3 and 398.3 nm, obtained by means of an axial pulse discharge, are reported.
Keywords :
Gas lasers; Ultraviolet lasers; Electrons; Frequency; Laser excitation; Laser feedback; Laser mode locking; Laser transitions; Optical pulses; Pump lasers; Waveguide lasers; Xenon;
Journal_Title :
Quantum Electronics, IEEE Journal of
DOI :
10.1109/JQE.1981.1071321
