Comments on "Prototype SECS message service for communication in the semiconductor manufacturing environment

Author

Baratz, J.M. ; Birchak, J. ; Vallino, James R.

Author_Institution

Digital Equip. Corp., Marlborough, MA, USA

Volume

2

Issue

4

fYear

1989

Firstpage

178

Abstract

For the original article see ibid., vol.2, no.4, p.165-77 (1989). The commenters note that the final SMS (SECS message service) documents contain editorial and nomenclature differences from the prototype protocol described in the above-named work by J.R. Moyne and L.C. McAfee Jr. These differences are summarized as follows: (1) the new documents adhere more closely to ISO style conventions for documentation; (2) the Service Document introduces formal models for the services; (3) the Service and Protocol were aligned to be similar to ISO 9506, MMS; and (4) the Protocol was specified using Abstract Syntax One notation, ISO 8824.<>

Keywords

electronic messaging; integrated circuit manufacture; open systems; protocols; semiconductor device manufacture; standards; Abstract Syntax One notation; ISO 8824; ISO style conventions; SECS message service; bidirectional protocol; data communication; documentation; semiconductor manufacturing environment; Etching; Message service; Plasma applications; Plasma properties; Protocols; Prototypes; Semiconductor device manufacture; Semiconductor materials; Software prototyping;

fLanguage

English

Journal_Title

Semiconductor Manufacturing, IEEE Transactions on

Publisher

ieee

ISSN

0894-6507

Type

jour

DOI

10.1109/66.44621

Filename

44621