DocumentCode :
1090637
Title :
Epitaxial layer enhancement of n-well guard rings for CMOS circuits
Author :
Troutman, R.R.
Author_Institution :
IBM General Technology Division, Burlington, VT
Volume :
4
Issue :
12
fYear :
1983
fDate :
12/1/1983 12:00:00 AM
Firstpage :
438
Lastpage :
440
Abstract :
n-well guard rings have long been used for isolating potential electron injectors to avoid latch-up of CMOS circuits. Such guard rings are shown to be orders of magnitude more efficient for CMOS fabricated in an epitaxial layer (epi-CMOS) than for bulk (non-epi) CMOS. The maximum escape probability in epi-CMOS measures 3.9E-06 while for bulk CMOS it is 1.8E-02.
Keywords :
Boosting; CMOS process; Circuits; Current measurement; Doping; Electrons; Epitaxial layers; Lighting control; Silicon; Substrates;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1983.25794
Filename :
1483538
Link To Document :
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