DocumentCode
1091876
Title
Improvement in GaAs MESFET drain conductance by a steplike-gate structure
Author
Tomizawa, Masaaki ; Uchida, Masao ; Sugeta, Takayuki
Author_Institution
Nippon Telegraph and Telephone Public Corporation, Kanagawa, Japan
Volume
31
Issue
4
fYear
1984
fDate
4/1/1984 12:00:00 AM
Firstpage
435
Lastpage
439
Abstract
A new steplike-gate GaAs MESFET structure, having a low drain conductance in comparison with a conventional recess structure, is presented. In order to reduce the drain conductance, the device design parameters related to gate structures are optimized using a two-dimensional device simulator. Experimental results obtained from fabricated devices, based on these optimized device parameters, show excellent low drain conductance characteristics. The reduced drain conductance can improve the maximum available gain in high-frequency GaAs analog integrated circuits.
Keywords
Analog integrated circuits; Circuit simulation; Electrodes; Electrons; Gallium arsenide; MESFETs; Telegraphy; Telephony; Transconductance; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1984.21547
Filename
1483832
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