• DocumentCode
    1091876
  • Title

    Improvement in GaAs MESFET drain conductance by a steplike-gate structure

  • Author

    Tomizawa, Masaaki ; Uchida, Masao ; Sugeta, Takayuki

  • Author_Institution
    Nippon Telegraph and Telephone Public Corporation, Kanagawa, Japan
  • Volume
    31
  • Issue
    4
  • fYear
    1984
  • fDate
    4/1/1984 12:00:00 AM
  • Firstpage
    435
  • Lastpage
    439
  • Abstract
    A new steplike-gate GaAs MESFET structure, having a low drain conductance in comparison with a conventional recess structure, is presented. In order to reduce the drain conductance, the device design parameters related to gate structures are optimized using a two-dimensional device simulator. Experimental results obtained from fabricated devices, based on these optimized device parameters, show excellent low drain conductance characteristics. The reduced drain conductance can improve the maximum available gain in high-frequency GaAs analog integrated circuits.
  • Keywords
    Analog integrated circuits; Circuit simulation; Electrodes; Electrons; Gallium arsenide; MESFETs; Telegraphy; Telephony; Transconductance; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1984.21547
  • Filename
    1483832