DocumentCode
1091928
Title
Modeling and characterization for high-speed GaAlAs-GaAs n-p-n heterojunction bipolar transistors
Author
Kurata, Mamoru ; Yoshida, Jiro
Author_Institution
Toshiba Research and Development Center, Kawasaki, Japan
Volume
31
Issue
4
fYear
1984
fDate
4/1/1984 12:00:00 AM
Firstpage
467
Lastpage
473
Abstract
A numerical one-dimensional model is employed to predict dc and switching characteristics for n-p-n type GaAlAs-GaAs transistors, including heteroemitter-homocollector and heteroemitter-heterocollector junction structure, where four kinds of doping profiles are considered. Also, Si and GaAs homojunction transistors are referred to for comparison. Switching performance is discussed for a single unit case, with and without a base resistance, and for a DCTL-type two-stage inverter case, including the delay time dependence on fanout.
Keywords
Capacitance; Charge carrier processes; Doping profiles; Equations; Gallium arsenide; Heterojunction bipolar transistors; Inverters; Numerical models; Photonic band gap; Semiconductor process modeling;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1984.21552
Filename
1483837
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