• DocumentCode
    1091928
  • Title

    Modeling and characterization for high-speed GaAlAs-GaAs n-p-n heterojunction bipolar transistors

  • Author

    Kurata, Mamoru ; Yoshida, Jiro

  • Author_Institution
    Toshiba Research and Development Center, Kawasaki, Japan
  • Volume
    31
  • Issue
    4
  • fYear
    1984
  • fDate
    4/1/1984 12:00:00 AM
  • Firstpage
    467
  • Lastpage
    473
  • Abstract
    A numerical one-dimensional model is employed to predict dc and switching characteristics for n-p-n type GaAlAs-GaAs transistors, including heteroemitter-homocollector and heteroemitter-heterocollector junction structure, where four kinds of doping profiles are considered. Also, Si and GaAs homojunction transistors are referred to for comparison. Switching performance is discussed for a single unit case, with and without a base resistance, and for a DCTL-type two-stage inverter case, including the delay time dependence on fanout.
  • Keywords
    Capacitance; Charge carrier processes; Doping profiles; Equations; Gallium arsenide; Heterojunction bipolar transistors; Inverters; Numerical models; Photonic band gap; Semiconductor process modeling;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1984.21552
  • Filename
    1483837