• DocumentCode
    1091953
  • Title

    Theory of conduction in polysilicon: Drift-diffusion approach in crystalline-amorphous-crystalline semiconductor system—Part II: General I-V theory

  • Author

    Khondker, A.N. ; Kim, Dae M. ; Ahmed, S.S. ; Shah, Rajiv R.

  • Author_Institution
    Rice University, Houston, TX
  • Volume
    31
  • Issue
    4
  • fYear
    1984
  • fDate
    4/1/1984 12:00:00 AM
  • Firstpage
    493
  • Lastpage
    500
  • Abstract
    A general model for conduction in polysilicon is presented for arbitrary applied voltage. The model incorporates the effect of mobile carrier redistribution under bias and accounts for the high field switching in amorphous grain boundary. Microscopic mobilities used for describing the carrier transport provides a physical basis for introducing the grain voltage across the unit cell of polysilicon. The voltage, in turn, distributes itself to preserve a constant current density therein. This new criterion yields a new voltage partitioning scheme, and a general expression for the corresponding current is derived in terms of pertinent system parameters.
  • Keywords
    Amorphous materials; Breakdown voltage; Conductivity; Crystallization; Current density; Genetic expression; Grain boundaries; Instruments; Microscopy; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1984.21555
  • Filename
    1483840