DocumentCode
1091953
Title
Theory of conduction in polysilicon: Drift-diffusion approach in crystalline-amorphous-crystalline semiconductor system—Part II: General I-V theory
Author
Khondker, A.N. ; Kim, Dae M. ; Ahmed, S.S. ; Shah, Rajiv R.
Author_Institution
Rice University, Houston, TX
Volume
31
Issue
4
fYear
1984
fDate
4/1/1984 12:00:00 AM
Firstpage
493
Lastpage
500
Abstract
A general model for conduction in polysilicon is presented for arbitrary applied voltage. The model incorporates the effect of mobile carrier redistribution under bias and accounts for the high field switching in amorphous grain boundary. Microscopic mobilities used for describing the carrier transport provides a physical basis for introducing the grain voltage across the unit cell of polysilicon. The voltage, in turn, distributes itself to preserve a constant current density therein. This new criterion yields a new voltage partitioning scheme, and a general expression for the corresponding current is derived in terms of pertinent system parameters.
Keywords
Amorphous materials; Breakdown voltage; Conductivity; Crystallization; Current density; Genetic expression; Grain boundaries; Instruments; Microscopy; Threshold voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1984.21555
Filename
1483840
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