DocumentCode :
1092014
Title :
Studies of organic molecules as saturable absorbers at 193 nm
Author :
Muller, David F. ; Rothschild, Mordekhay ; Boyer, Keith ; Rhodes, Charles K.
Author_Institution :
University of Illinois at Chicago Circle, Chicago, IL, USA
Volume :
18
Issue :
11
fYear :
1982
fDate :
11/1/1982 12:00:00 AM
Firstpage :
1865
Lastpage :
1871
Abstract :
A systematic study of several classes of organic molecules in liquid solvents has been performed to survey candidates suitable as saturable absorbers at 193 nm. Materials with appropriate optical properties would serve the essential function of optical isolation in the implementation of high-energy picosecond ArF* laser systems. Twenty-three molecular systems have been found which exhibit appropriate saturation behavior at practical fluences. The properties of these systems, including solvent effects, are discussed.
Keywords :
Carbon materials/devices; Laser absorbers; Noble-gas lasers; Optical isolators; Ultraviolet propagation; Gas lasers; Helium; Laser mode locking; Nonlinear optics; Optical materials; Optical pulses; Optical saturation; Physics; Pulse amplifiers; Solvents;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1982.1071462
Filename :
1071462
Link To Document :
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