Control of MMST RTP: repeatability, uniformity, and integration for flexible manufacturing [ICs]

A real-time multivariable strategy is used to control the uniformity and repeatability of wafer temperature in rapid thermal processing (RTP) semiconductor device manufacturing equipment. This strategy is based on a physical model of the process where the model parameters are estimated using an experimental design procedure. The internal model control (IMC) law design methodology is used to automatically compute the lamp powers to a multizone array of concentric heating zones to achieve wafer temperature uniformity. Control actions are made in response to real-time feedback information provided by temperature sensing, via pyrometry, at multiple points across the wafer. Several modules, including model-scheduling and antiovershoot, are coordinated with IMC to achieve temperature control specifications. The control strategy, originally developed for prototype equipment at Stanford University, is analyzed via the customization, integration, and performance on eight RTP reactors at Texas Instruments conducting thirteen different thermal fabrication operations of two sub-half-micron CMOS process technologies used in the the Microelectronics Manufacturing Science and Technology (MMST) program