DocumentCode
1092506
Title
Low-power high-speed InP MISFET direct-coupled FET logic
Author
Messick, Louis J.
Author_Institution
Naval Ocean Systems Center, San Diego, CA
Volume
31
Issue
6
fYear
1984
fDate
6/1/1984 12:00:00 AM
Firstpage
763
Lastpage
766
Abstract
High-dynamic-range n-channel InP MISFET direct-coupled FET logic ring oscillator and inverter integrated circuits with minimum observed propagation delay per stage
ps with associated power delay product of 41 fJ and minimum observed power delay product
fJ with associated delay of 84 ps have been fabricated on Fe-doped semi-insulating substrate material using ion implantation for contact and load channel regions and pyrolytic SiO2 as the gate insulator. Accumulation-type enhancement-mode MISFET structures with source-drain separations of 1.5 µm and gate metallization lengths of 3.0 µm were employed as driver devices while both MESFET\´s and 1.5-µm-length ungated "velocity saturation" structures were used as loads. With
V representative inverter structures exhibited logic swings of 3.58 V, noise margins of 1.00 and 0.92 V, and dc gain in the linear region of 2.2.
ps with associated power delay product of 41 fJ and minimum observed power delay product
fJ with associated delay of 84 ps have been fabricated on Fe-doped semi-insulating substrate material using ion implantation for contact and load channel regions and pyrolytic SiO
V representative inverter structures exhibited logic swings of 3.58 V, noise margins of 1.00 and 0.92 V, and dc gain in the linear region of 2.2.Keywords
FET integrated circuits; Indium phosphide; Insulation; Ion implantation; Logic circuits; MISFETs; Metallization; Propagation delay; Pulse inverters; Ring oscillators;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1984.21604
Filename
1483889
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