High-dynamic-range n-channel InP MISFET direct-coupled FET logic ring oscillator and inverter integrated circuits with minimum observed propagation delay per stage

ps with associated power delay product of 41 fJ and minimum observed power delay product

fJ with associated delay of 84 ps have been fabricated on Fe-doped semi-insulating substrate material using ion implantation for contact and load channel regions and pyrolytic SiO
2as the gate insulator. Accumulation-type enhancement-mode MISFET structures with source-drain separations of 1.5 µm and gate metallization lengths of 3.0 µm were employed as driver devices while both MESFET\´s and 1.5-µm-length ungated "velocity saturation" structures were used as loads. With

V representative inverter structures exhibited logic swings of 3.58 V, noise margins of 1.00 and 0.92 V, and dc gain in the linear region of 2.2.